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Статьи в журналах
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- 2006 Characteristics of a Multilayer SiOx(CH)yNz Film Deposited by Low Temperature Plasma Enhanced Chemical Vapor Deposition Using Hexamethyldisilazane/Ar/N2O
- Lee June Hee, Jeong Chang Hyun, Lim Jong Tae, Zavaleyev Viktor A., Kyung Se Jin, Yeom Geun Young
- в журнале Japanese Journal of Applied Physics, издательство Institute of Pure and Applied Physics (Japan), том 45, № 10S, с. 8430 DOI