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Статьи в журналах
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- 2019 HIGH-RATE HIGH-DENSITY ICP ETCHING OF GERMANIUM
- Lagov P.B., Maslovsky V.M., Pavlov Yu S., Rogovsky E.S., Drenin A.S., Bondariev V.A.
- в журнале High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes, издательство Begell House Inc. (Danbury, United States), том 23, № 1, с. 57-70 DOI
Статьи в сборниках
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- 2019 Detection of unreliable superluminescent diode chips using gamma-irradiation
- Lagov P.B., Maslovsky V.M.
- в сборнике Lecture Notes in Mechanical Engineering, место издания Springer Nature Springer Nature Singapore Pte Ltd. 2019, с. 309-317 DOI
Тезисы докладов
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- 2019 Chlorine-Based Plasma Etch in GaAs Triple-Junction Solar Cells Technology
- Lagov P.B., Maslovsky V.M., Miakonkikh A.V., Pavlov Yu S., Lebedev A.A.
- в сборнике 11th International Conference New Electrical and Electronic Technologies and their Industrial Implementation (NEET 2019), место издания Lublin University of Technology, Lublin, Poland, тезисы