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High temperature vapor deposition, an effective tool for the production of coatingsтезисы доклада
- Авторы: Wahl G., Stadel O., Gorbenko O., Kaul A.
- Сборник: 10-th International JUPAC Conference on High Temperature Materials Chemistry
- Том: 2
- Тезисы
- Год издания: 2000
- Место издания: Julich, Germany
- Первая страница: 2167
- Последняя страница: 2175
- Аннотация: Chemical vapor deposition (CVD) processes have a large throwing power and can operate at atmospheric pressure. Therefore, they are economical for many applications. High-temperature CVD processes give a good control of the crystal structure (e.g., epitaxial layers or other special layer structures) and support diffusion processes. The are used, for example, for the following deposition processes: 1) perovskites, 2) yttrium-stabilized ZrO2 layers as ion conductors or heat barrier coatings, 3) aluminide diffusion coatings in long tubes for corrosion protection, and 4) BN on fibers for fiber-reinforced materials. The special properties of the perovskite CVD are discussed in more detail. These processes are described for small- and large-scale applications. The CVD process is simulated by the computer code Fluent.
- Добавил в систему: Кауль Андрей Рафаилович