Calculation of Mass Distributions of Cu Surface Fragments Sputtered by Ar Cluster Ions Based on Molecular Dynamics SimulationстатьяИсследовательская статья
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Аннотация:Molecular dynamics simulation of the interaction processes of Arn clusters with the Cu surface at different E/n ratios was performed. The mass distributions of sputtered fragments were calculated. It was shown that these distributions are described by a power law as a function of the fragment size. The dependences of the exponent on the energy and the size of the primary cluster were studied; it was shown that it correlates with the total sputtering yield similarly to the case of sputtering by atomic ions.
