The effect of gas pressure during ion-plasma deposition on the microstructure of M-coatings and the emission properties of molecular sputter-deposited oxide cathodes

Информация о цитировании статьи получена из Web of Science
Дата последнего поиска статьи во внешних источниках: 24 ноября 2021 г.

Авторы: Zhabin G., Arkhipov D.
Журнал: ITM Web of Conferences
Том: 30
Год издания: 2019
Первая страница: 02006
DOI: 10.1051/itmconf/20193002006
Аннотация: The results of the study of the effect of gas pressure and gas composition bу ion-plasma deposition of oxide coatings on the microstructure and the emission properties of molecular sputter-deposited oxide cathodes (MSDOC) are presented. Scanning electron microscopy (SEM) with an energy-dispersive spectrometer (EDS) and atomic force microscopy (AFM) has been used to investigate changes in the morphology, microstructure, and elemental composition of the films. It is shown that with decreasing pressure, the emission properties of films improve, the coating density and grain size increase, and the roughness decreases.
Добавил в систему: Жабин Г.А.

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