Molecular structure and intramolecular motion of hexamethyldisiloxane from gas-phase electron diffractionстатья
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Дата последнего поиска статьи во внешних источниках: 14 февраля 2019 г.
Аннотация:The molecular structure of hexamethyldisiloxane has been reinvestigated by electron diffraction. The two kinds of large amplitude motion in the molecule, the Si-O-Si bending and the torsion about the Si-O bonds, were treated independently in terms of their potential functions. In the equilibrium structure the molecule has probably C(2v), symmetry with staggered C3Si-O-Si fragments and a nonlinear Si-O-Si linkage with an angle of 155°. The barrier to linearization was obtained to be at least 10 kJ mol-1. In addition, there is free or nearly free internal rotation of the trimethylsilyl groups in hexamethyldisiloxane. In terms of r(g) bond lengths the electron diffraction analysis yielded Si-O 1.639 ± 0.003 Å, Si-C 1.871 ± 0.004 Å, and the r(a) angle Si-O-Si 152 ± 2°.